Dubai, United Arab Emirates

Soniya Soniya

This inventor holds 2 USPTO granted patents. Top assignee: Avery Dennison Corporation. Active years: 2021-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Soniya Soniya. Retrieved from https://idiyas.com/inventor/soniya-soniya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2021-2024

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2 patents (USPTO):Explore Patents

Title: Soniya Soniya: Innovator in Fastening Technologies

Introduction

Soniya Soniya is a prominent inventor based in Dubai, AE. She has made significant contributions to the field of fastening technologies, holding two patents that showcase her innovative spirit and technical expertise.

Latest Patents

Her latest patents include an "Apparatus and methods for fastening an element to a support structure." This apparatus features a first hollow needle and a first ejector pin, designed with a stepped recess on its outer peripheral surface. The invention may also include a second hollow needle and a cap that can be mounted to the apparatus's nose, allowing for precise insertion and functionality. Another notable patent is the "Cap for a nose of a fastening apparatus," which enhances the usability of fastening devices.

Career Highlights

Soniya works at Avery Dennison Corporation, a company known for its innovative solutions in materials and labeling. Her work has contributed to advancements in fastening technologies, making her a valuable asset to her team and the industry.

Collaborations

Soniya collaborates with notable coworkers, including Robert Charles Uschold and David Gregory Honan, who share her commitment to innovation and excellence in their respective fields.

Conclusion

Soniya Soniya's contributions to fastening technologies through her patents reflect her dedication to innovation and problem-solving. Her work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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