This inventor holds 1 USPTO granted patent. Top assignee: Uwiz Technology Co., Ltd.. Active years: 2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2011
Title: The Innovative Contributions of Songyuan Chang
Introduction
Songyuan Chang is a notable inventor based in Zhongli, Taiwan. He has made significant contributions to the field of chemical mechanical planarization, particularly in the polishing of metal surfaces. His innovative approach has led to the development of a unique composition that enhances the efficiency of the polishing process.
Latest Patents
Songyuan Chang holds a patent for a composition useful in the chemical mechanical planarization of metal. This polishing composition includes polishing abrasive, an oxidizing agent, an accelerating compound, an inhibitor, a co-inhibitor, and a solvent. The invention is designed to maintain a high removal rate during polishing while inhibiting static etch rates and reducing defects such as metal dishing and erosion. This composition simplifies the processing and minimizes waste, particularly during the polishing of bulk copper layers.
Career Highlights
Chang is currently associated with Uwiz Technology Co., Ltd., where he applies his expertise in developing advanced polishing compositions. His work has been instrumental in improving the efficiency and effectiveness of metal polishing processes in various applications.
Collaborations
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Conclusion
Songyuan Chang's innovative contributions to chemical mechanical planarization demonstrate his commitment to advancing technology in the field. His patented composition not only enhances polishing efficiency but also addresses common challenges in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile