Seongnam, South Korea

Songwhe Herr

This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignee: Asm IP Holding B.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Songwhe Herr. Retrieved from https://idiyas.com/inventor/songwhe-herr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Songwhe Herr: Innovator in Plasma Processing Technology

Introduction

Songwhe Herr is a notable inventor based in Seongnam, South Korea. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on developing advanced systems for substrate and wafer processing using plasma phase shift techniques.

Latest Patents

Herr's latest patents include a "Substrate Processing Apparatus Using Plasma Phase Shift" and a "Wafer Processing Apparatus Using Plasma Phase Shift." The substrate processing system is designed to comprise multiple reaction chambers on a platform, each configured to process substrates. It features a plasma generator that generates plasma or plasma power with specific frequencies and phases. The control circuit allows for independent phase adjustments of the plasma provided to each reaction chamber. Similarly, the wafer processing system employs a comparable design, focusing on the processing of wafers with the same advanced plasma technology.

Career Highlights

Songwhe Herr is currently associated with Asm IP Holding B.V., where he continues to innovate in the field of plasma processing. His expertise in this area has positioned him as a key player in the development of cutting-edge technologies that enhance substrate and wafer processing efficiency.

Collaborations

Throughout his career, Herr has collaborated with talented individuals such as Jeongsu Lee and Dongok Shin. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Songwhe Herr's contributions to plasma processing technology demonstrate his commitment to innovation and excellence in the field. His patents reflect a deep understanding of the complexities involved in substrate and wafer processing, paving the way for future advancements in this critical area of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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