This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignee: Asm IP Holding B.v.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Songwhe Herr: Innovator in Plasma Processing Technology
Introduction
Songwhe Herr is a notable inventor based in Seongnam, South Korea. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on developing advanced systems for substrate and wafer processing using plasma phase shift techniques.
Latest Patents
Herr's latest patents include a "Substrate Processing Apparatus Using Plasma Phase Shift" and a "Wafer Processing Apparatus Using Plasma Phase Shift." The substrate processing system is designed to comprise multiple reaction chambers on a platform, each configured to process substrates. It features a plasma generator that generates plasma or plasma power with specific frequencies and phases. The control circuit allows for independent phase adjustments of the plasma provided to each reaction chamber. Similarly, the wafer processing system employs a comparable design, focusing on the processing of wafers with the same advanced plasma technology.
Career Highlights
Songwhe Herr is currently associated with Asm IP Holding B.V., where he continues to innovate in the field of plasma processing. His expertise in this area has positioned him as a key player in the development of cutting-edge technologies that enhance substrate and wafer processing efficiency.
Collaborations
Throughout his career, Herr has collaborated with talented individuals such as Jeongsu Lee and Dongok Shin. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Songwhe Herr's contributions to plasma processing technology demonstrate his commitment to innovation and excellence in the field. His patents reflect a deep understanding of the complexities involved in substrate and wafer processing, paving the way for future advancements in this critical area of technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile