Songlin Xu

Title: The Innovative Contributions of Songlin Xu

Introduction

Songlin Xu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of plasma technology, particularly in the design of plasma reactors. With a total of two patents to his name, Xu's work focuses on enhancing plasma uniformity and efficiency.

Latest Patents

Xu's latest patents include an innovative design for an inductively coupled plasma (ICP) reactor. This design features an enclosure where part of the ceiling acts as a dielectric window. A substrate support is located within the enclosure, positioned below the dielectric window. An RF power applicator is situated above the dielectric window, radiating RF power into the enclosure. Additionally, a plurality of gas injectors is uniformly distributed above the substrate support to supply processing gas. A circular baffle is also included inside the enclosure, positioned above the substrate support but below the gas injectors, to redirect the flow of processing gas.

Career Highlights

Throughout his career, Songlin Xu has worked with notable companies such as Advanced Micro-Fabrication Equipment Inc. and Advanced Micro-Fabrication Equipment, Inc. Asia. His experience in these organizations has allowed him to develop and refine his innovative ideas in plasma technology.

Collaborations

Xu has collaborated with esteemed colleagues, including Tuqiang Q Ni and Gang Shi. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Songlin Xu's contributions to plasma technology through his innovative patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in plasma reactor design and efficiency.