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Shanghai, China

Advanced Micro-fabrication Equipment Inc, Shanghai

USPTO Granted Patents = 14

EPO Patents = 1

Forward Citations = 118

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37 inventors (with patents filed for the assignee):

Steven Tianxiao Lee (4 out of 4 patents)

Tuqiang Q Ni (4 out of 59 patents)

Xiaoming He (3 out of 6 patents)

4. Lei Wan (2 out of 5 patents)

5. Zhaoyang Xu (2 out of 5 patents)

6. Gerald Zheyao Yin (2 out of 29 patents)

7. Baoxia Tian (2 out of 2 patents)

8. Yingbin Liu (2 out of 2 patents)

9. Quanyong Guo (2 out of 2 patents)

10. Zhiyou Du (2 out of 4 patents)

11. Jinyuan Chen (2 out of 10 patents)

12. Ping Yang (2 out of 3 patents)

13. Hanting Zhang (2 out of 2 patents)

14. Yousen Li (2 out of 2 patents)

15. Lei Xu (1 out of 23 patents)

14 patents: Sort by Forward Citations

1. 10281215 - Apparatus and method for controlling heating of base within chemical vapour deposition chamber (2019-05-07),

2. 10240231 - Chemical vapor deposition apparatus and its cleaning method (2019-03-26),

3. 10201069 - High frequency power supply device and high frequency power supplying method (2019-02-05),

4. 9951435 - Coating packaged chamber parts for semiconductor plasma apparatus (2018-04-24),

5. 9851151 - Apparatus and method for controlling heating of base within chemical vapour deposition chamber (2017-12-26),

6. 9696209 - Method for measuring temperature of film in reaction chamber (2017-07-04),

7. 9633884 - Performance enhancement of coating packaged ESC for semiconductor apparatus (2017-04-25),

8. 9617633 - Coating packaged chamber parts for semiconductor plasma apparatus (2017-04-11),

9. 9534724 - Gas showerhead, method for making the same and thin film growth reactor (2017-01-03),

10. 9443715 - Method and device for measuring temperature of substrate in vacuum processing apparatus (2016-09-13),

11. 9431216 - ICP source design for plasma uniformity and efficiency enhancement (2016-08-30),

12. 9275870 - Plasma processing method and plasma processing device (2016-03-01),

13. 9230781 - Capacitive-coupled plasma processing apparatus and method for processing substrate (2016-01-05),

14. 9208998 - Multi-station decoupled reactive ion etch chamber (2015-12-08),

AMFESH, or Advanced Micro-Fabrication Equipment Inc, is a leading semiconductor equipment manufacturer based in Shanghai. With innovative technologies and advanced fabrication solutions, AMFESH caters to the rapidly growing semiconductor industry. Their cutting-edge equipment enables the production of high-quality integrated circuits, microchips, and other semiconductor devices. AMFESH is known for its dedication to research and development, collaborating with industry leaders to deliver state-of-the-art solutions. Visit their website for more information.

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Company Badge

USPTO Data Jan 1 1976 - Dec 2 2025

14 Patents

#172 in Shanghai

#1,797 in China

#40,857 in the World

Shanghai, China

Advanced Micro-fabrication Equipment Inc, Shanghai

Forward Citations = 118

37 inventors:

Steven Tianxiao Lee (4 out of 4 patents)

Tuqiang Q Ni (4 out of 59 patents)

Xiaoming He (3 out of 6 patents)

4. Lei Wan (2 out of 5 patents)

5. Zhaoyang Xu (2 out of 5 patents)

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