Fujian, China

Songhua Gan

This inventor holds 1 USPTO granted patent. Top assignee: Faurecia Clarion Electronics (Xiamen) Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Songhua Gan. Retrieved from https://idiyas.com/inventor/songhua-gan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations by Songhua Gan in Illumination Technology

Introduction

Songhua Gan is an accomplished inventor based in Fujian, China. He has made significant contributions to the field of illumination technology. His innovative approach focuses on enhancing brightness control in illumination devices.

Latest Patents

One of Songhua Gan's notable patents is a method for brightness control in illumination devices. This patent, titled "Brightness control method of illumination device, brightness control device and brightness control system," outlines a process that involves obtaining the brightness of ambient light. It determines the amount of supplementary light needed when the ambient light is below a target brightness. The method generates a first pulse signal based on the supplementary light amount to control the illumination device's light emission.

Career Highlights

Songhua Gan is currently employed at Faurecia Clarion Electronics (Xiamen) Co., Ltd. His work at this company has allowed him to develop and refine his innovative ideas in illumination technology.

Collaborations

Some of his coworkers include Jie Qiu and Chen Shen, who contribute to the collaborative environment that fosters innovation.

Conclusion

Songhua Gan's work in brightness control technology exemplifies the impact of innovative thinking in the field of illumination. His contributions continue to advance the capabilities of illumination devices, showcasing the importance of research and development in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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