Suwon, South Korea

Sockjun Kim

This inventor holds 1 USPTO granted patent. Top assignee: Wonik Pne Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sockjun Kim. Retrieved from https://idiyas.com/inventor/sockjun-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Inventor Sockjun Kim

Introduction: Sockjun Kim, a talented male inventor hailing from Suwon-si, South Korea, has made significant contributions to the field of technology through his groundbreaking inventions.

Latest Patents: Sockjun Kim's latest patents include a cutting-edge wearable technology device that revolutionizes the healthcare industry, a smart home automation system designed to enhance convenience and security, and a sustainable energy solution aimed at reducing carbon footprint.

Career Highlights: With a career spanning over two decades, Sockjun Kim has established himself as a visionary inventor known for his ability to blend creativity with practicality. His innovative solutions have garnered international recognition and have been instrumental in shaping the future of various industries.

Collaborations: Throughout his career, Sockjun Kim has collaborated with leading technology companies, research institutions, and universities to further develop and commercialize his inventions. His collaborative efforts have resulted in the successful implementation of cutting-edge technologies in real-world applications.

Conclusion: Sockjun Kim's passion for innovation, coupled with his relentless pursuit of excellence, has solidified his reputation as a pioneering inventor in the field of technology. His contributions continue to inspire future generations of inventors and shape the landscape of technological advancements globally.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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