Cheonan, South Korea

So Hyung Jiong

This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignee: Semes Co., Ltd.. Active years: 2024-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: So Hyung Jiong. Retrieved from https://idiyas.com/inventor/so-hyung-jiong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: So Hyung Jiong: Innovator in Substrate Technology

Introduction

So Hyung Jiong is a notable inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of substrate technology, particularly through his innovative designs that enhance durability and efficiency.

Latest Patents

So Hyung Jiong holds a patent for a "Substrate Supporting Apparatus and Substrate Treating Apparatus Including the Same." This invention provides a substrate supporting apparatus with improved durability. The apparatus features a body made of a dielectric substance, a heat transfer medium supply hole that penetrates the body, and two electrostatic electrodes that work in conjunction to support the substrate effectively.

Career Highlights

So Hyung Jiong is currently employed at Semes Co., Ltd., where he continues to develop advanced technologies in substrate support systems. His work has been instrumental in enhancing the performance and reliability of substrate treatment processes.

Collaborations

So Hyung Jiong collaborates with Jong Gun Lee, a talented woman in the field, contributing to innovative projects and advancements in substrate technology.

Conclusion

So Hyung Jiong's contributions to substrate technology through his patent and work at Semes Co., Ltd. highlight his role as an influential inventor in the industry. His innovative designs continue to pave the way for advancements in substrate treatment applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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