Skip B Larson

Title: The Innovative Contributions of Skip B Larson

Introduction

Skip B Larson is a notable inventor based in Fort Collins, Colorado. He has made significant contributions to the field of plasma processing and thin film deposition technologies. With a total of 5 patents to his name, Larson's work has had a considerable impact on various industries.

Latest Patents

One of Larson's latest patents is titled "Systems and methods for single magnetron sputtering." This patent describes a system that includes a power supply, a plasma chamber enclosing a substrate, an anode, and a target for depositing thin film material on the substrate. The system also features a datastore with uncoated anode characterization data and an anode sputtering adjustment system. This system generates a first health value indicative of whether the anode is coated with a dielectric material. Additionally, it includes an anode power controller that adjusts the anode sputtering energy to optimize the deposition process.

Another significant patent is "Current threshold response mode for arc management." This innovation outlines systems and methods for extinguishing electrical arcs in a plasma processing chamber. Upon detecting an arc, the steady state voltage provided to the chamber is reduced, allowing the current to decay below a steady state value. This technique enables a faster return to steady state levels compared to traditional arc mitigation methods.

Career Highlights

Throughout his career, Skip B Larson has worked with several prominent companies, including Advanced Energy Industries, Inc. and Aes Global Holdings. His expertise in plasma processing has made him a valuable asset in these organizations, contributing to advancements in technology and innovation.

Collaborations

Larson has collaborated with notable professionals in his field, including Kenneth E Nauman, Jr. and David J Christie. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Skip B Larson's contributions to the field of plasma processing and thin film deposition are noteworthy. His innovative patents and career achievements reflect his dedication to advancing technology. Larson's work continues to influence the industry and inspire future innovations.