This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1978.
Company Filing History:
Years Active: 1978
Title: Skinner Logan - Innovator in Thin Film Technology
Introduction
Skinner Logan is a notable inventor based in Poughkeepsie, NY (US). She has made significant contributions to the field of thin film technology, particularly through her innovative patent. Her work has implications for various applications in electronics and materials science.
Latest Patents
Skinner Logan holds a patent for a "Structure for making coplanar layers of thin films." This patent describes a method for forming coplanar thin films, specifically conductor-insulator patterns, on a substrate. The process involves creating a pattern that includes a first thin film and an expendable material deposited on it. The expendable material can be selectively removed by an etchant that does not affect the first thin film or the insulator to be deposited. The second thin film is then deposited using RF sputtering at a bias that allows for substantial reemission of the second film. This technique results in a coplanar pattern of first and second thin films, which can be utilized in various electronic applications.
Career Highlights
Skinner Logan is currently associated with the International Business Machines Corporation (IBM). Her work at IBM has allowed her to explore and develop advanced technologies in the field of thin films. She has demonstrated a commitment to innovation and excellence throughout her career.
Collaborations
Skinner has collaborated with notable colleagues, including Janos Havas and John S Lechaton. These collaborations have contributed to her success and the advancement of her research in thin film technology.
Conclusion
Skinner Logan is a pioneering inventor whose work in thin film technology has made a significant impact in her field. Her innovative patent and contributions to IBM highlight her dedication to advancing technology and materials science.