Saitama, Japan

Sizuo Sekino

This inventor holds 1 USPTO granted patent. Top assignees: Fuji Photo Film Company, Limited, Fuji Photo Optical Co., Ltd.. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sizuo Sekino. Retrieved from https://idiyas.com/inventor/sizuo-sekino

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Sizuo Sekino: Innovator in Photosensitive Material Processing

Introduction

Sizuo Sekino is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of photosensitive material processing. His innovative approach has led to the development of a unique apparatus that enhances operational efficiency.

Latest Patents

Sizuo Sekino holds a patent for a photosensitive material processing apparatus. This apparatus includes a main body designed for processing photosensitive materials as they are conveyed. It features a magazine for supplying the material, a shutter for opening and closing, and conveying rollers that nip the material during operation. The design allows for a reduction in labor by integrating the nipping actions of the rollers with the shutter's opening and closing functions.

Career Highlights

Throughout his career, Sizuo Sekino has worked with prominent companies such as Fuji Photo Optical Co., Ltd. and Fuji Photo Film Company, Limited. His experience in these organizations has contributed to his expertise in the field of optical technology and material processing.

Collaborations

Sizuo Sekino has collaborated with notable colleagues, including Yasunobu Sakaguchi and Shinichi Yorifuji. These partnerships have fostered innovation and advancements in their respective fields.

Conclusion

Sizuo Sekino's contributions to photosensitive material processing exemplify his innovative spirit and dedication to improving operational efficiency. His patent and career achievements reflect his significant impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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