Siyu Zhu

Title: Innovations of Siyu Zhu in Semiconductor Processing

Introduction

Siyu Zhu is an accomplished inventor based in San Jose, CA. She has made significant contributions to the field of semiconductor processing, particularly through her innovative patent related to boron nitride for mask patterning. Her work is instrumental in advancing the technology used in semiconductor manufacturing.

Latest Patents

Siyu Zhu holds a patent for "Boron nitride for mask patterning." This patent outlines exemplary deposition methods that involve delivering a boron-containing precursor and a nitrogen-containing precursor to a processing region of a semiconductor processing chamber. The methods also include providing a hydrogen-containing precursor alongside the other precursors, with a flow rate ratio of the hydrogen-containing precursor to either the boron-containing precursor or the nitrogen-containing precursor being greater than or about 2:1. Additionally, the methods describe forming a plasma of all precursors within the processing region and depositing a boron-and-nitrogen material on a substrate within the chamber.

Career Highlights

Siyu Zhu is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her work at Applied Materials has allowed her to focus on innovative solutions that enhance semiconductor processing techniques. With her expertise, she has contributed to the development of advanced materials and methods that are crucial for modern electronics.

Collaborations

Siyu collaborates with talented individuals in her field, including her coworkers Chuanxi Yang and Hang Yu. These collaborations foster a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Siyu Zhu's contributions to semiconductor processing through her innovative patent demonstrate her expertise and commitment to advancing technology in this critical field. Her work continues to influence the future of semiconductor manufacturing.