Battaramulla, Sri Lanka

Sithila Dassanayake

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024

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2 patents (USPTO):Explore Patents

Title: Innovations by Sithila Dassanayake

Introduction

Sithila Dassanayake is an accomplished inventor based in Battaramulla, Sri Lanka. He has made significant contributions to the field of textile innovation, holding two patents that showcase his expertise and creativity. His work focuses on developing fabrics with unique properties that enhance their functionality and versatility.

Latest Patents

Sithila's latest patents include "Fabric with Bi-Directional Thickness Variation" and "Fabric with Variable Fabric Properties." The first patent describes a weft knit spacer fabric that features variable thicknesses, achieved by adjusting the density of tuck stitches and the thickness of the spacer yarn. This innovative fabric can take on a free-standing 3-dimensional shape, making it a moulded fabric. The second patent outlines a fabric composed of multiple regions, each formed from thermoplastic polymer materials, allowing for different fabric properties across the regions. This versatility opens up new possibilities in textile applications.

Career Highlights

Throughout his career, Sithila has worked with notable companies such as Mas Innovation (Private) Limited and Mas Innovation Limited. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking projects in the textile industry.

Collaborations

Sithila has collaborated with talented individuals like Ranil Vitarana and Dilru Roshan Ratnaweera. These partnerships have fostered a creative environment that encourages innovation and the development of new ideas.

Conclusion

Sithila Dassanayake is a remarkable inventor whose work in textile innovation has led to the development of unique fabrics with enhanced properties. His contributions to the field are noteworthy and continue to inspire advancements in textile technology.

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