Guangdong, China

Siru Fei

This inventor holds 1 USPTO granted patent. Top assignee: 1More Inc.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Siru Fei. Retrieved from https://idiyas.com/inventor/siru-fei

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 40(Granted Patents)


Company Filing History:


Years Active: 2018

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Siru Fei: Innovator in Headphone Technology

Introduction

Siru Fei is a notable inventor based in Guangdong, China. He has made significant contributions to the field of audio technology, particularly through his innovative designs in headphones. With a focus on enhancing user experience, his work has garnered attention in the tech community.

Latest Patents

Siru Fei holds a patent for a headphone design, showcasing his commitment to advancing audio technology. This patent reflects his dedication to creating high-quality audio experiences for consumers. He has achieved 1 patent in this area, highlighting his innovative approach.

Career Highlights

Fei is currently employed at 1More Inc., a company known for its dedication to producing high-quality audio products. His role at 1More Inc. allows him to collaborate with other talented individuals in the industry, further enhancing his contributions to headphone technology.

Collaborations

Siru Fei has worked alongside notable colleagues such as Kuan-hong Hsieh and Shichen Xu. Their collaborative efforts have led to advancements in headphone design and functionality, showcasing the power of teamwork in innovation.

Conclusion

Siru Fei's contributions to headphone technology exemplify his innovative spirit and dedication to enhancing audio experiences. His work at 1More Inc. and his collaborations with talented colleagues position him as a key figure in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…