Sirko Kramp

Title: Sirko Kramp: Innovator in Advanced Process Control Methods

Introduction

Sirko Kramp is a notable inventor based in Langebrück, Germany. He has made significant contributions to the field of advanced process control, particularly in the context of manufacturing processes. His innovative approach has led to the development of methods that enhance the precision and efficiency of process-aware dimension targeting.

Latest Patents

Sirko Kramp holds a patent for "Advanced process control methods for process-aware dimension targeting." This patent discloses methods of advanced process control (APC) for specific processes, such as photolithography or etch processes performed on wafers. The invention involves measuring a parameter on a target feature and using that value for APC. Instead of relying solely on the actual parameter value, the method applies an offset amount, determined from an average distribution of parameter values across all features, to obtain an adjusted parameter value. This approach minimizes dimension variations from pattern to pattern, ensuring consistency in the manufacturing process.

Career Highlights

Sirko Kramp is currently employed at Globalfoundries Inc., where he continues to innovate in the field of semiconductor manufacturing. His work focuses on improving process control methods that are critical for the production of high-quality semiconductor devices. With a patent portfolio that includes 1 patent, he has established himself as a key figure in his area of expertise.

Collaborations

Throughout his career, Sirko has collaborated with talented professionals, including Philipp Jaschinsky and Frank Kahlenberg. These collaborations have contributed to the advancement of technologies in the semiconductor industry.

Conclusion

Sirko Kramp's contributions to advanced process control methods have made a significant impact on the semiconductor manufacturing industry. His innovative approaches continue to drive improvements in process efficiency and precision.