Suwon, South Korea

Sion Lee

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sion Lee. Retrieved from https://idiyas.com/inventor/sion-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Sion Lee - Innovator in Near-Field Detection Technology

Introduction

Sion Lee is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of near-field detection technology. His innovative work has led to the development of a unique patent that enhances the capabilities of detection systems.

Latest Patents

Sion Lee holds a patent for a "Probe for detecting near field and near-field detection system including the same." This patent describes a near-field detection system that includes an electric field generator, a probe for detecting the near field, a current detector, and a laser system. The probe features a cantilever substrate with an antenna electrode, an electromagnetic wave blocking layer, and an insulating layer, all designed to improve detection accuracy.

Career Highlights

Sion Lee is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology. His work at Samsung has allowed him to collaborate with other talented individuals in the field, further enhancing his contributions to innovation.

Collaborations

Some of Sion Lee's notable coworkers include Jongmin Yoon and Namil Koo. Their collaborative efforts have played a crucial role in advancing the projects they work on together.

Conclusion

Sion Lee's innovative spirit and dedication to advancing near-field detection technology have made him a valuable asset in the field. His patent and work at Samsung Electronics Co., Ltd. exemplify his commitment to innovation and excellence.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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