Company Filing History:
Years Active: 1997
Title: Sinobu Ono - Innovator in Photosensitive Material Technology
Introduction
Sinobu Ono is a notable inventor based in Ohmiya, Japan. He has made significant contributions to the field of photography and printing technology. His innovative approach has led to the development of a unique mechanism that enhances the functionality of auto-printers.
Latest Patents
Ono holds a patent for a photosensitive material feed mechanism designed for the exposure station of an auto-printer. This invention allows for the smooth feeding of photosensitive material into the exposure station without the need for an increased number of parts. The mechanism features a guide structure that ensures the forward end of the photosensitive material is properly aligned during the loading process. This design improves the efficiency of the auto-printer, making it easier to produce high-quality prints.
Career Highlights
Throughout his career, Sinobu Ono has worked with prominent companies in the photography industry, including Fuji Photo Film Company, Limited and Fuji Photo Optical Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in printing technology.
Collaborations
Ono has collaborated with talented individuals such as Mamoru Ogasawara and Shuji Tahara. These partnerships have fostered innovation and creativity in his projects, leading to successful outcomes in the field of photography.
Conclusion
Sinobu Ono's contributions to the field of auto-printing technology demonstrate his innovative spirit and dedication to improving photographic processes. His patent for the photosensitive material feed mechanism is a testament to his expertise and commitment to advancing technology in this area.