Photosensitive material feed mechansim for auto-printer's exposure

Abstract

A photosensitive material feed mechanism for the exposure station of an auto-printer in which a forward end of a lith plate is formed with a guide structure without a need for an increased number of parts in a manner that a photosensitive material may be smoothly fed into the exposure station with a forward end of photosensitive material being guided by the above-mentioned guide structure when the mechanism is initially loaded with photosensitive material. A greeting card kit serving as the exposure station of the auto-printer includes a basic frame, upper and lower guide plates fixed to the basic frame, and a douser exposed externally of the greeting card kit. The lith plate is formed with a character zone exposure window and a picture zone exposure window in addition to the previously mentioned guide structure and is capable of being withdrawably inserted into the greeting card kit through the externally exposed douser. A feed path for the photosensitive material may be laid upon the guide structure to initiate feed of photosensitive material immediately after loading thereof. The photosensitive material may also be laid upon the respective exposure windows to achieve exposure of the photosensitive material to the respective zone. A forward end of the guide structure is formed with an edge function to wedge photosensitive material aside as the lith plate is inserted into the greeting card kit after the mechanism has been loaded with photosensitive material.