Sagamihara, Japan

Sinji Kubota


Average Co-Inventor Count = 9.0

ph-index = 2

Forward Citations = 35(Granted Patents)


Company Filing History:


Years Active: 1994-1999

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3 patents (USPTO):Explore Patents

Title: Sinji Kubota: Innovator in Magnetron Plasma Processing Technology

Introduction

Sinji Kubota is a notable inventor based in Sagamihara, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 3 patents. His work focuses on developing advanced apparatuses that enhance etching processes in various applications.

Latest Patents

Kubota's latest patents include a magnetron plasma processing apparatus and processing method. This invention provides a novel magnetron plasma processing apparatus that comprises a vacuum chamber for storing an etching object. It features a first electrode that holds the etching object and a second electrode that is disposed in opposition to the first electrode, with both electrodes being parallel to each other. A gas-supply unit feeds etching gas to the vacuum chamber, while a magnetic-field generating means is positioned opposite the first electrode. The power-supply unit feeds power to either the first or second electrodes, generating discharge between them. The magnetic-field generating means includes a magnetic block with magnetic poles of inverse polarity on both ends, along with a plane recess opposite the second electrode.

Career Highlights

Throughout his career, Sinji Kubota has worked with prominent companies such as Tokyo Electron Limited and Kabushiki Kaisha Toshiba. His experience in these organizations has contributed to his expertise in the field of plasma processing technology.

Collaborations

Kubota has collaborated with notable coworkers, including Hiromi Harada and Hiromi Kumagai, who have contributed to his innovative projects.

Conclusion

Sinji Kubota's work in magnetron plasma processing technology showcases his dedication to innovation and advancement in the field. His patents reflect a commitment to improving etching processes, making significant strides in technology.

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