Yokohama, Japan

Sinji Fuwa

This inventor holds 1 USPTO granted patent. Top assignees: Chlorine Engineers Corp., Ltd., Kuri Chemical Engineers, Inc.. Active years: 1978.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sinji Fuwa. Retrieved from https://idiyas.com/inventor/sinji-fuwa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 1978

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1 patent (USPTO):Explore Patents

Title: Sinji Fuwa: Innovator in Gas Separation Technology

Introduction

Sinji Fuwa is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of gas separation technology. His innovative approach has led to the development of a unique process for concentrating or liquefying specific components of gaseous mixtures.

Latest Patents

Sinji Fuwa holds 1 patent for his invention titled "Process for concentrating or liquefying a specified component of a gaseous mixture." This patent describes a method that involves passing a starting gaseous mixture through an adsorbing device. The process allows for the selective separation of a gaseous substance while maintaining a steady state in the gas recycling system.

Career Highlights

Throughout his career, Sinji Fuwa has worked with several companies, including Kuri Chemical Engineers, Inc. and Chlorine Engineers Corporation. His experience in these organizations has contributed to his expertise in gas separation technologies.

Collaborations

Sinji has collaborated with Setuya Kuri, a talented woman in the field, enhancing the development of innovative solutions in gas separation.

Conclusion

Sinji Fuwa's contributions to gas separation technology demonstrate his commitment to innovation and excellence. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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