Company Filing History:
3 out of 993 
3 out of 5,576 
Years Active: 2008-2011
Title: Simona Petroni: Innovator in Post-Etch Cleaning Methods
Introduction
Simona Petroni is a notable inventor based in Lecce, Italy. She has made significant contributions to the field of semiconductor manufacturing, particularly in the area of cleaning processes following etching. With a total of 4 patents to her name, her work focuses on enhancing cleaning efficiency while minimizing damage to device structures.
Latest Patents
One of her latest patents is a method for post-etch cleans. This invention provides a cleaning process that ensures greater efficiency with reduced damage to device structures. The process begins with a first plasma clean, which may consist of multiple steps. Following this, a first HO based clean is performed, which can include a de-ionized water rinse, a water vapor clean, or a plasma clean that incorporates hydrogen and oxygen. After the first HO based clean, a second plasma clean is executed, again potentially comprising multiple steps. This is followed by a second HO based clean, which may also involve a de-ionized water rinse, a water vapor clean, or a plasma clean with hydrogen and oxygen. The invention is particularly useful after various etching processes, such as metal etch or polysilicon etch, and allows for the removal of photoresist at low temperatures.
Career Highlights
Throughout her career, Simona has worked with prominent companies in the semiconductor industry, including Novellus Systems Incorporated and STMicroelectronics S.r.l. Her expertise in cleaning processes has made her a valuable asset in these organizations.
Collaborations
Simona has collaborated with notable professionals in her field, including David L. Chen and Yuh-Jia (Jim) Su. These collaborations have further enriched her work and contributed to her innovative approaches.
Conclusion
Simona Petroni's contributions to the field of semiconductor manufacturing through her innovative cleaning methods highlight her role as a leading inventor. Her patents reflect a commitment to improving efficiency and reducing damage in critical manufacturing processes.