Company Filing History:
Years Active: 2016
Title: Simon Wang - Innovator in Semiconductor Technology
Introduction
Simon Wang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique method for semiconductor selective etching and BSI image sensors.
Latest Patents
Simon Wang holds a patent for a method of selectively etching a semiconductor device and manufacturing a BSI image sensor. This method involves etching a doped silicon substrate with an HNA solution for a predetermined time duration. The etching solution has a concentration of nitrite ions, which is crucial for the etching process. The semiconductor device is etched using this solution, which requires an initial concentration of nitride ions that is lower than the final concentration. The HNA solution consists of hydrofluoric acid (HF), nitric acid (HNO), and acetic acid (CHCOOH). The resulting BSI image sensor device achieves a uniform thickness when etched with the obtained etching solution. Simon Wang has 1 patent to his name.
Career Highlights
Simon Wang is currently employed at Semiconductor Manufacturing International Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the manufacturing processes of semiconductor devices.
Collaborations
Simon collaborates with talented individuals in his field, including coworkers Phil Wu and Victor Luo. Their combined expertise contributes to the innovative projects at Semiconductor Manufacturing International Corporation.
Conclusion
Simon Wang is a key figure in the semiconductor industry, known for his innovative methods and contributions to technology. His work continues to influence the development of advanced semiconductor devices.