Geneva, IL, United States of America

Simon W Kwan


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1997-1999

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2 patents (USPTO):Explore Patents

Title: Simon W Kwan: Innovator in Diamond Film Technology

Introduction

Simon W Kwan is a notable inventor based in Geneva, IL (US), recognized for his contributions to the field of diamond film technology. With a total of 2 patents to his name, Kwan has made significant advancements that enhance the performance of diamond films in various applications.

Latest Patents

Kwan's latest patents include a process for making a cesiated diamond film field emitter. This innovative process involves depositing cesium iodide on a diamond film in a controlled vacuum environment, followed by increasing the vacuum and applying an electron beam to incorporate cesium into the diamond film. The resulting cesiated diamond film exhibits an operating voltage reduced by a factor of at least approximately 2.5 compared to conventional non-cesiated diamond film field emitters. Another patent focuses on diamond films treated with alkali-halides, which serve as secondary electron emitters.

Career Highlights

Kwan is affiliated with Universities Research Association, Inc., where he continues to explore and develop cutting-edge technologies in the field of diamond films. His work has contributed to advancements that have practical implications in various scientific and industrial applications.

Collaborations

Kwan collaborates with fellow inventor David F Anderson, enhancing the scope and impact of their research endeavors.

Conclusion

Simon W Kwan's innovative work in diamond film technology showcases his commitment to advancing scientific knowledge and practical applications. His patents reflect a deep understanding of materials science and engineering, positioning him as a key figure in this specialized field.

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