Laval, Canada

Simon Beaulne

This inventor holds 0 USPTO granted patents, plus 1 CIPO patent.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Simon Beaulne. Retrieved from https://idiyas.com/inventor/simon-beaulne-vd6ri4e6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

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Title: Simon Beaulne: Innovator in Real-Time Processing Line Tracking

Introduction

Simon Beaulne is an inventor based in Laval, Canada. He has made significant contributions to the field of processing line technology, particularly in real-time tracking systems. His innovative approach aims to enhance the efficiency of product processing lines.

Latest Patents

Simon Beaulne holds a patent titled "Methode Et Dispositif De Suivi De Ligne De Traitement De Produits." This invention focuses on a method for the real-time tracking of a processing line that includes a series of product processing stations and accumulators. The method involves monitoring the operation of the processing line and reporting this information on a display. A key feature of the invention is the calculation of the duration for each processing station based on the accumulation time of the products. This technology is particularly applicable to multi-station bottle and flask packaging lines.

Career Highlights

Simon Beaulne is currently employed at Sidel Canada Inc., where he continues to develop innovative solutions for the packaging industry. His work has been instrumental in improving the efficiency and reliability of processing lines.

Collaborations

Simon collaborates with his coworker, Franck Klotz, to further enhance their projects and drive innovation within their company.

Conclusion

Simon Beaulne's contributions to real-time processing line tracking demonstrate his commitment to innovation in the packaging industry. His work not only improves operational efficiency but also sets a standard for future developments in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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