Winkelhaid, Germany

Silke Kaftanski

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Silke Kaftanski. Retrieved from https://idiyas.com/inventor/silke-kaftanski

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 29(Granted Patents)


Company Filing History:

goldMedal1 out of 834,513 
Other
 patents

Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Silke Kaftanski

Introduction: Silke Kaftanski, an accomplished inventor from Winkelhaid, Germany, has made significant strides in the field of technology and innovation. Her impressive contribution to the industry is underscored by her patent focusing on electrolytic deposition of metal layers.

Latest Patents: Silke holds one notable patent titled "Process and apparatus for electrolytic deposition of metal layers". This innovative invention showcases her ability to merge scientific principles with practical applications, addressing crucial aspects in the manufacturing processes of metal coatings.

Career Highlights: Silke Kaftanski has established herself as a prominent figure in her field, showcasing her skills and expertise through her inventive work. Her dedication and innovative approach have gained recognition not only among peers but also in the broader engineering community.

Collaborations: Throughout her career, Silke has collaborated with notable colleagues like Rolf Schumacher and Wolfgang Dahms. These partnerships have undoubtedly contributed to her innovative endeavors, fostering an environment where ideas can flourish and transform into groundbreaking inventions.

Conclusion: Silke Kaftanski's contributions to the world of patents and inventions exemplify the spirit of innovation. With her patent on the electrolytic deposition process, she continues to inspire future generations of inventors and innovators, proving that the pursuit of knowledge and creativity knows no bounds.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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