Guangzhou, China

Siliang He

USPTO Granted Patents = 1 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Siliang He: Innovator in Substrate Bonding Technology

Introduction

Siliang He is a notable inventor based in Guangzhou, China. He has made significant contributions to the field of electronic technology, particularly in substrate bonding methods. His innovative approach has led to the development of a unique patent that enhances the efficiency and effectiveness of substrate bonding processes.

Latest Patents

Siliang He holds a patent for a substrate bonding method. This method involves several key steps, including providing a first and a second substrate, forming metal micro-bump arrays on both substrates, and pressing them together to create a physically interwoven interlocking structure. The process also includes applying a filling material and curing it to form a bonding cavity, followed by confined heating reflux on the micro-bump arrays. This innovative technique is designed to improve the reliability and performance of electronic components.

Career Highlights

Siliang He is currently employed at Shenzhen Xiuyuan Electronic Technology Co., Ltd. His work at this company has allowed him to focus on advancing substrate bonding technologies. With his expertise, he has contributed to the development of cutting-edge solutions that meet the demands of modern electronics.

Collaborations

Siliang He has collaborated with several talented individuals in his field, including Yunzhi Ling and Jianguo Ma. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Siliang He is a prominent figure in the realm of substrate bonding technology. His patent and contributions to Shenzhen Xiuyuan Electronic Technology Co., Ltd. highlight his commitment to advancing electronic manufacturing processes. His work continues to influence the industry and pave the way for future innovations.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…