Tokyo, Japan

Sigeru Hirayama

This inventor holds 1 USPTO granted patent. Top assignees: Toppan Printing Co., Ltd., Toyo Ink Mfg. Co., Ltd.. Active years: 1986.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sigeru Hirayama. Retrieved from https://idiyas.com/inventor/sigeru-hirayama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1986

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1 patent (USPTO):Explore Patents

Title: Sigeru Hirayama and His Lithographic Printing Plate Invention.

Introduction

Sigeru Hirayama is an inventor associated with Tokyo, Japan. His work includes a patent for a lithographic printing plate designed to address limitations in conventional zinc oxide master papers and improve sensitivity to long-wavelength laser light.

Latest Patents

Hirayama is credited with 1 patent: “Lithographic Printing Plate.” The invention describes an electrophotographic plate with a photoconductive layer on a conductive substrate. The layer contains a mixture of phthalocyanine pigment, zinc oxide, and zinc sulfide dispersed in a binder resin, with the phthalocyanine pigment making up no more than 50 percent by weight of the mixture. The plate is charged, exposed to an image to create an electrostatic latent image, developed with ink-receptive toner, and fixed. The stated aim is to provide practical sensitivity to long-wavelength laser light while overcoming disadvantages of conventional zinc oxide master papers.

Career Highlights

Hirayama’s listed company affiliations include Toyo Ink Mfg. Co., Ltd. and Toppan Printing Co., Ltd. His patent reflects work in electrophotographic plate technology and lithographic printing.

Collaborations

His listed coworkers include Isao Kumano and Tsuneo Tanaka.

Conclusion

Sigeru Hirayama’s patent describes a lithographic printing plate intended to combine practical long-wavelength laser sensitivity with an electrophotographic production process.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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