This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Toshiba. Active years: 1988.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1988
Title: Sigeo Yoneyama: Innovator in Shadow Mask Technology
Introduction
Sigeo Yoneyama is a notable inventor based in Yokosuka, Japan. He has made significant contributions to the field of technology, particularly in the development of devices for color cathode ray tubes. His innovative approach has led to the creation of a unique patent that enhances the efficiency of manufacturing processes.
Latest Patents
Yoneyama holds a patent for a "Device for warm press forming a plate-like member into a shadow mask for a color cathode ray tube." This device features a mold designed to apply pressure to a plate-like member, incorporating a heated inner section and an outer section. The insulation means between these sections effectively reduces heat transmission, thereby increasing the thermal efficiency of the device. This innovation is crucial for improving the production of shadow masks, which are essential components in color cathode ray tubes.
Career Highlights
Sigeo Yoneyama is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to collaborate with other talented professionals in the field. His contributions have not only advanced the technology but have also positioned him as a respected figure in the industry.
Collaborations
Yoneyama has worked alongside notable colleagues such as Masanori Igaki and Yoshimichi Hori. Their combined expertise has fostered an environment of innovation and creativity, leading to advancements in technology and product development.
Conclusion
Sigeo Yoneyama's contributions to the field of technology, particularly through his patent for a device used in the production of shadow masks, highlight his role as an influential inventor. His work continues to impact the industry positively, showcasing the importance of innovation in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
