Kenmore, NY, United States of America

Siew Wah Chai

This inventor holds 1 USPTO granted patent. Top assignee: Praxair Technology, Inc.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Siew Wah Chai. Retrieved from https://idiyas.com/inventor/siew-wah-chai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Siew Wah Chai: Innovator in Pressure Swing Adsorption Technology

Introduction

Siew Wah Chai is a notable inventor based in Kenmore, NY (US). He has made significant contributions to the field of pressure swing adsorption technology. His innovative work has led to advancements that enhance efficiency and reduce costs in industrial applications.

Latest Patents

Siew Wah Chai holds a patent for an "Intensified Pressure Swing Adsorption System and Process Cycles." This invention relates to intensified 5-bed and 6-bed PSA process cycles. It features fast rate adsorbents that enable the intensified PSA system to meet cost and performance targets. The proposed capital-efficient HPSA system offers an opportunity to reduce PSA capital expenditure by ten percent (10%).

Career Highlights

Chai is currently employed at Praxair Technology, Inc., where he continues to develop innovative solutions in gas separation technologies. His work has been instrumental in advancing the capabilities of pressure swing adsorption systems.

Collaborations

One of his notable coworkers is Yang Luo, with whom he collaborates on various projects related to their field of expertise.

Conclusion

Siew Wah Chai's contributions to pressure swing adsorption technology exemplify his commitment to innovation and efficiency. His patent and ongoing work at Praxair Technology, Inc. highlight his role as a key figure in this important area of industrial technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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