Singapore, Singapore

Siew W Sum

This inventor holds 1 USPTO granted patent. Top assignee: Hgst Netherlands, B.v.. Active years: 2015.


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Siew W Sum: Innovator in Contaminant Removal Technology

Introduction

Siew W Sum is a notable inventor based in Singapore, SG. He has made significant contributions to the field of manufacturing technology, particularly in the area of contaminant removal from manufactured parts. With a focus on automation, his work aims to enhance efficiency and cleanliness in manufacturing processes.

Latest Patents

Siew W Sum holds a patent for a method of automatically removing contaminants from a manufactured part. This innovative solution involves a first robotic arm that automatically holds the manufactured part while a second arm sprays it with a specially formulated solution. This solution effectively removes contaminants, which are then collected for disposal. His patent represents a significant advancement in manufacturing technology, showcasing the potential for automation to improve production quality.

Career Highlights

Siew W Sum is currently employed at HGST Netherlands B.V., where he continues to develop and refine his innovative ideas. His work at the company has allowed him to collaborate with other talented professionals in the field, contributing to advancements in manufacturing processes.

Collaborations

Some of Siew W Sum's coworkers include Yi Zhao Yao and Sai H Wong. Their collaborative efforts in the workplace have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.

Conclusion

Siew W Sum's contributions to the field of manufacturing through his innovative patent demonstrate his commitment to improving industrial processes. His work not only enhances efficiency but also sets a standard for future advancements in the industry.

Profile summary based on public USPTO records.
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