Hsinchu, Taiwan

Siew Seong Tan

This inventor holds 1 USPTO granted patent. Top assignee: Memsor Corporation. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Siew Seong Tan. Retrieved from https://idiyas.com/inventor/siew-seong-tan-7echqogd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Siew Seong Tan: Innovator in Suspension Object Technology

Introduction

Siew Seong Tan is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of microfabrication, particularly in the development of methods for forming suspension objects on monolithic substrates. His innovative approach has implications for various applications in electronics and materials science.

Latest Patents

Siew Seong Tan holds a patent for a "Method of forming suspension object on monolithic substrate." This patent describes a technique involving a silicon base layer that includes a circuit layer with multiple regions. The method utilizes a wet etching region to create an etching path, allowing for the formation of a suspended microstructure region. This innovative process enhances the capabilities of microfabrication techniques.

Career Highlights

Siew Seong Tan is currently associated with Memsor Corporation, where he applies his expertise in microfabrication and semiconductor technology. His work at Memsor Corporation focuses on advancing the development of innovative materials and devices that leverage his patented methods.

Conclusion

Siew Seong Tan's contributions to the field of microfabrication through his patented methods demonstrate his role as a key innovator. His work continues to influence advancements in technology and materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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