Roermond, Netherlands

Sietse Oostra

This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sietse Oostra. Retrieved from https://idiyas.com/inventor/sietse-oostra

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Sietse Oostra: Innovator in Dielectric Ceramics

Introduction

Sietse Oostra is a notable inventor based in Roermond, Netherlands. He has made significant contributions to the field of dielectric ceramics, particularly through his innovative patent. His work is recognized for its complexity and potential applications in various technological fields.

Latest Patents

Oostra holds a patent for a substituted barium-neodymium-titanium-perovskite, which features a unique defect structure. The patent describes a general composition that includes various cations, such as Ba²⁺ and Nd³⁺, along with titanium Ti⁴⁺. This invention has implications for advancements in materials science and electronics.

Career Highlights

Throughout his career, Sietse Oostra has been associated with U.S. Philips Corporation, where he has contributed to research and development in advanced materials. His expertise in dielectric ceramics has positioned him as a key figure in the industry.

Collaborations

Oostra has worked alongside esteemed colleagues, including Heinz Kohler and Dieter W Mateika. Their collaborative efforts have furthered the understanding and application of innovative materials in technology.

Conclusion

Sietse Oostra's contributions to the field of dielectric ceramics exemplify the impact of innovative thinking in technology. His patent and collaborations highlight the importance of research and development in advancing material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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