Siegfried Bocklisch

Title: The Innovations of Siegfried Bocklisch

Introduction

Siegfried Bocklisch is a notable inventor based in Munich, Germany. He has made significant contributions to the field of photographic printing technology. His innovative approach has led to the development of a unique apparatus for handling photographic film.

Latest Patents

Bocklisch holds a patent for an "Apparatus for and method for handling film in a photographic printer." This invention focuses on the print-exposure section of a photographic printer. The apparatus includes a mask that matches the film frame and features a window for the passage of exposure light. Additionally, the mask has holes for directing air onto the film, enhancing the handling process. The design includes a guide for the edges of the film, which parallels and demarcates a gap with the mask. Air is supplied to the mask and film through air-direction openings, utilizing both overpressure and underpressure to facilitate film advancement and exposure.

Career Highlights

Bocklisch's career is marked by his dedication to improving photographic technology. His work at Agfa-Gevaert AG has positioned him as a key player in the industry. His innovative solutions have streamlined processes and improved the quality of photographic prints.

Collaborations

Throughout his career, Bocklisch has collaborated with talented individuals such as Wolfgang Fielder and Helmut Treiber. These partnerships have fostered a creative environment that has led to groundbreaking advancements in photographic technology.

Conclusion

Siegfried Bocklisch's contributions to the field of photographic printing are noteworthy. His innovative patent and collaborative efforts have significantly impacted the industry. His work continues to inspire advancements in photographic technology.