Kelkheim, Germany

Siegfried Bildstein

This inventor holds 2 USPTO granted patents. Top assignee: Hoechst Aktiengesellschaft. Active years: 1978-1991.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Location History:

  • Kelkheim, Taunus, DE (1978)
  • Kelkheim, DE (1991)

Company Filing History:


Years Active: 1978-1991

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2 patents (USPTO):Explore Patents

Title: Siegfried Bildstein: Innovator in Chemical Processes

Introduction

Siegfried Bildstein is a notable inventor based in Kelkheim, Germany. He has made significant contributions to the field of chemical processes, particularly in the recovery and manufacture of naphthalene-sulfonic acids. With a total of 2 patents to his name, Bildstein's work has had a meaningful impact on industrial applications.

Latest Patents

Bildstein's latest patents include a process for the separation and recovery of naphthalene-sulfonic acids. This invention relates to a method where naphthalenesulfonic acids are adsorbed on basic ion exchangers and subsequently desorbed using an alkaline liquor. The alkali metal sulfonates are then precipitated by cooling. Another significant patent is for the manufacture of naphthalene-monosulfonic acids, which involves the preparation of these acids from naphthalene and sulfuric acid at elevated temperatures.

Career Highlights

Siegfried Bildstein has been associated with Hoechst Aktiengesellschaft, a prominent company in the chemical industry. His work has contributed to advancements in chemical manufacturing processes, showcasing his expertise and innovative thinking.

Collaborations

Throughout his career, Bildstein has collaborated with notable colleagues such as Ulrich Girrbach and Siegbert Rittner. These collaborations have further enriched his work and contributed to the success of his inventions.

Conclusion

Siegfried Bildstein stands out as an influential inventor in the field of chemical processes. His patents reflect his commitment to innovation and his contributions to the industry will continue to be recognized.

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