Siddharth Srivastava

Title: Innovations of Siddharth Srivastava

Introduction

Siddharth Srivastava is a notable inventor based in Hayward, CA (US). He has made significant contributions to the field of metrology and lithography, holding a total of 5 patents. His work focuses on advanced measurement techniques that enhance the accuracy of overlay error assessments in semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "Signal response metrology for image based and scatterometry overlay measurements." This patent presents methods and systems for measuring overlay error between structures formed on a substrate by successive lithographic processes. The approach utilizes two overlay targets, each with programmed offsets in opposite directions, to perform an overlay measurement. Overlay error is measured based on zero order scatterometry signals, with data collected from each target at two different azimuth angles. Additionally, methods for creating an image-based measurement model using measured, image-based training data are introduced. This trained model is then employed to calculate values of parameters of interest directly from measured image data collected from other wafers. The described methods are applicable to both metrology and inspection applications.

Another significant patent by Siddharth is also focused on "Image based signal response metrology." Similar to the previous patent, it details methods and systems for measuring overlay error using two overlay targets with programmed offsets. The measurement process involves zero order scatterometry signals and data collection at different azimuth angles. The creation of an image-based measurement model based on training data is also a key aspect of this patent, allowing for direct calculations from measured image data.

Career Highlights

Siddharth has worked with prominent companies in the industry, including Carl Zeiss Meditec GmbH and KLA-Tencor Corporation. His experience in these organizations has contributed to his expertise in metrology and lithography.

Collaborations

Throughout his career, Siddharth has collaborated with notable professionals such as Harihar Narasimha-Iyer and Tilman Schmoll. These collaborations have further enriched his work and innovations in the field.

Conclusion

Siddharth Srivastava's contributions to the field of metrology and lithography through his patents and collaborations highlight his role as an influential inventor. His innovative approaches continue to advance the accuracy and efficiency of semiconductor manufacturing processes.