Sibylle L Reithel

Title: Sibylle L Reithel: Innovator in Color Filter Technology

Introduction

Sibylle L Reithel is a prominent inventor based in Ontario, NY (US). She has made significant contributions to the field of color filter technology, holding 2 patents that showcase her innovative approach to image sensors.

Latest Patents

Her latest patents include "Color filter arrays with optimum dye density" and "Color filter array." The first patent describes a method for creating a color filter array using a dye solution with a charge opposite to that of a mordant, along with an ionic component of the same charge as the dye solution. The second patent outlines a color filter array suitable for image sensors, which consists of a first layer with a mordant of one polarity and a first dye of the opposite polarity, and a second layer with a second mordant and dye of opposing polarities.

Career Highlights

Sibylle is currently employed at Eastman Kodak Company, where she continues to develop innovative solutions in imaging technology. Her work has been instrumental in advancing the capabilities of color filter arrays, which are essential for high-quality image capture.

Collaborations

Throughout her career, Sibylle has collaborated with notable colleagues, including Ronald W Wake and Hugh G McGuckin. These partnerships have contributed to her success and the advancement of her projects.

Conclusion

Sibylle L Reithel's contributions to color filter technology highlight her role as a leading inventor in the field. Her innovative patents and collaborations reflect her commitment to advancing imaging technology.