Suwon, South Korea

Si-wan Kim

This inventor holds 1 USPTO granted patent. Top assignees: Samsung Electronics Co., Ltd., Seneka Co., Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Si-wan Kim. Retrieved from https://idiyas.com/inventor/si-wan-kim-40q3efhc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2017

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Si-wan Kim: Innovator in Wearable Technology

Introduction

Si-wan Kim is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of wearable technology, particularly with his innovative designs that enhance user experience and functionality.

Latest Patents

Si-wan Kim holds a patent for a wearable device that can transform between an annularly bent state and a flat state. This device includes a plurality of segment members, which consist of a top portion and a bottom portion that is shorter than the top portion. It features connecting members that allow for mutual rotation between segment members, a bistable spring that provides elasticity and retentivity, and a flexible display device supported on the top portion of the segment members.

Career Highlights

Throughout his career, Si-wan Kim has worked with prominent companies such as Samsung Electronics Co., Ltd. and Seneka Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technology in the wearable sector.

Collaborations

Si-wan Kim has collaborated with talented individuals such as Ho-seong Seo and Pil-je Cho. These partnerships have fostered innovation and creativity in his projects.

Conclusion

Si-wan Kim is a pioneering inventor in the realm of wearable technology, with a focus on creating devices that are both functional and adaptable. His contributions continue to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…