Asan, South Korea

Si-Ki Park

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Si-Ki Park. Retrieved from https://idiyas.com/inventor/si-ki-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2016

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Si-Ki Park: Innovator in Display Technology

Introduction

Si-Ki Park is a notable inventor based in Asan, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative patent related to backlight assemblies.

Latest Patents

Si-Ki Park holds a patent for a backlight assembly and display apparatus. This invention includes a light emitting portion, a chromaticity converter, and a light guide plate. The light emitting portion generates a first light, which is then processed by the chromaticity converter to produce a uniform light with consistent chromaticity. The light guide plate is designed to receive this uniform light and guide it to the display, enhancing the overall display quality of the apparatus.

Career Highlights

Si-Ki Park is currently employed at Samsung Display Co., Ltd., where he continues to work on advancements in display technologies. His expertise and innovative mindset have contributed to the company's reputation as a leader in the industry.

Collaborations

Si-Ki Park has collaborated with talented coworkers, including Hyuk-Hwan Kim and Young-Min Park. Their combined efforts in research and development have led to significant advancements in display technology.

Conclusion

Si-Ki Park's contributions to display technology through his patent demonstrate his innovative spirit and commitment to enhancing visual experiences. His work at Samsung Display Co., Ltd. continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…