Shyama P Mukherjee

Title: Shyama P Mukherjee: Innovator in Thin Film Technology

Introduction

Shyama P Mukherjee is a prominent inventor based in Hopewell Junction, NY (US). She has made significant contributions to the field of thin film technology, holding a total of 4 patents. Her innovative methods have advanced the capabilities of dielectric substrates and metal interconnections.

Latest Patents

One of her latest patents is a method for forming a thin film layer on a dielectric substrate. This method involves blanket depositing a nonconducting layer of material on the dielectric substrate, followed by a layer of polymeric dielectric material that is patterned to partially expose the underlying layer. The exposed layer is then contacted with a metallic salt solution, where the nonconducting material catalyzes the deposition of a seed layer. This allows for additional metallization to be easily electrolessly plated on the seed layer. Another notable patent involves the use of a palladium sulfate solution for selectively seeding metal interconnections on polyimide dielectric surfaces. This method ensures strong selectivity and the reliable removal of seeding material, preventing issues such as shorting and bridging during electroless plating.

Career Highlights

Shyama P Mukherjee is currently employed at International Business Machines Corporation (IBM), where she continues to innovate and develop new technologies. Her work has been instrumental in enhancing the performance and reliability of electronic components.

Collaborations

Throughout her career, she has collaborated with notable colleagues, including Terrence Robert O'Toole and Robert R Schaffer. These collaborations have further enriched her research and development efforts.

Conclusion

Shyama P Mukherjee's contributions to thin film technology and her innovative patents have made a significant impact in her field. Her work at IBM and collaborations with esteemed colleagues highlight her dedication to advancing technology.