Gamagori, Japan

Shuya Hayakawa

This inventor holds 1 USPTO granted patent. Top assignee: Takemoto Yushi Kabushiki Kaisha. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shuya Hayakawa. Retrieved from https://idiyas.com/inventor/shuya-hayakawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Shuya Hayakawa: Innovator in Sewing Thread Technology

Introduction

Shuya Hayakawa is a notable inventor based in Gamagori, Japan. He has made significant contributions to the field of sewing technology, particularly with his innovative approach to sewing thread treatment.

Latest Patents

Hayakawa holds a patent for a sewing thread treatment agent and sewing thread. The objective of this invention is to provide a solution that achieves low friction properties across a wide range of sewing speeds. The treatment agent is characterized by its unique composition, which includes hydroxy-terminated polydimethylsiloxane, a nonionic surfactant, and various types of waxes such as paraffin wax and carnauba wax.

Career Highlights

Hayakawa is associated with Takemoto Yushi Kabushiki Kaisha, a company known for its advancements in the textile industry. His work has been instrumental in enhancing the performance of sewing threads, making them more efficient for various applications.

Collaborations

Hayakawa has collaborated with notable colleagues, including Jun Ito and Hisanori Murata. Their combined expertise has contributed to the development of innovative solutions in sewing technology.

Conclusion

Shuya Hayakawa's contributions to sewing thread technology exemplify the impact of innovation in the textile industry. His patent for a sewing thread treatment agent showcases his commitment to improving sewing efficiency and performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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