Osaka, Japan

Shusuke Kitawaki


Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Innovations of Shusuke Kitawaki in Polishing Pad Technology

Introduction

Shusuke Kitawaki is an innovative inventor based in Osaka, Japan. He holds a patent for a unique thermoplastic poromeric polishing pad that showcases his contributions to the field of materials science and engineering. His work demonstrates a blend of creativity and technical expertise, positioning him as a noteworthy figure in his industry.

Latest Patents

Kitawaki's sole patent concerns the development of a thermoplastic poromeric polishing pad. This innovative pad features a porous polyurethane structure that includes large interconnected pores, allowing for enhanced polishing capabilities. The porous matrix comprises two distinct thermoplastic polymers, each formulated with specific molecular percentages of adipic acid, MDI, and ethylene glycol. These carefully selected materials and their properties contribute to the pad's effectiveness in industrial applications.

Career Highlights

Shusuke Kitawaki works for Rohm and Haas Electronic Materials CMP Holdings, Inc., a company renowned for its research and development in electronic materials. His position at this firm allows him to engage in cutting-edge innovations while contributing to the advancement of polishing technology used in semiconductor manufacturing.

Collaborations

Throughout his career, Kitawaki has collaborated with notable colleagues such as Shuiyuan Luo and George C. Jacob. These partnerships bring together diverse expertise, fostering an environment of innovation and knowledge sharing that enhances the development of new materials and technologies within their company.

Conclusion

Shusuke Kitawaki’s contributions to polishing pad technology exemplify the spirit of innovation that drives advancements in material sciences. With his pioneering work on thermoplastic poromeric polishing pads and his collaborative efforts at Rohm and Haas Electronic Materials CMP Holdings, Inc., Kitawaki continues to influence his field and inspire future developments in engineering and technology.

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