CHANGCHUN, China

Shuo Li

This inventor holds 1 USPTO granted patent. Top assignee: Chinese Academy of Sciences. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shuo Li. Retrieved from https://idiyas.com/inventor/shuo-li-k41yovsj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations by Shuo Li in Holographic Grating Technology

Introduction

Shuo Li is a notable inventor based in Changchun, China. He has made significant contributions to the field of holographic grating technology. His innovative approach addresses critical challenges in the development of grating substrates.

Latest Patents

Shuo Li holds a patent for a "Method and device for compensating surface error of holographic grating substrate." This invention relates to a technical field of grating development and utilizes scanning and exposure technology. The method and device employ surface error compensation technology based on phase modulation of interference fringes in a scanning beam interference lithography system. This innovation effectively resolves issues related to poor grating diffraction wavefront quality caused by surface processing errors. It enhances the full-aperture diffraction wavefront quality of the grating, thereby improving overall performance.

Career Highlights

Shuo Li is affiliated with the Chinese Academy of Sciences, where he continues to advance research in holographic grating technology. His work has garnered attention for its practical applications and contributions to the field.

Collaborations

Shuo Li collaborates with esteemed colleagues, including Yanxiu Jiang and Yubo Li. Their combined expertise fosters a productive research environment that drives innovation.

Conclusion

Shuo Li's contributions to holographic grating technology exemplify the impact of innovative thinking in addressing complex challenges. His patent reflects a commitment to enhancing the quality and efficiency of grating development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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