Company Filing History:
Years Active: 2004-2005
Title: Shuo-Cheng Wang: Innovator in Dielectric Technology
Introduction
Shuo-Cheng Wang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of dielectric materials, particularly in reducing stress in thick film applications. With a total of 2 patents, his work has implications for various technological advancements.
Latest Patents
Wang's latest patents focus on a method of reducing thick film stress of spin-on dielectric and the resulting sandwich dielectric structure. This innovative technique involves forming a sandwich dielectric structure where a first dielectric layer is created on a substrate through spin coating. A liquid phase deposited (LPD) silica layer is then formed on this first dielectric layer, followed by a second dielectric layer applied on the LPD silica layer via spin coating. Notably, the LPD silica layer can undergo nitrogen plasma treatment to enhance its thermal stability and resistance to water penetration.
Career Highlights
Shuo-Cheng Wang is affiliated with the National Science Council, where he continues to advance research in dielectric materials. His work is characterized by a commitment to innovation and practical applications in technology.
Collaborations
Wang has collaborated with notable colleagues, including Ching-Fa Yeh and Yueh-Chuan Lee, contributing to a dynamic research environment that fosters innovation.
Conclusion
Shuo-Cheng Wang's contributions to dielectric technology exemplify the impact of innovative thinking in material science. His patents reflect a dedication to solving complex challenges in the field, paving the way for future advancements.