Tokyo, Japan

Shunsuke Irie

This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Dai Nippon Printing Co., Ltd.. Active years: 2022-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shunsuke Irie. Retrieved from https://idiyas.com/inventor/shunsuke-irie

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 6.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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4 patents (USPTO):Explore Patents

Title: Shunsuke Irie: Innovator in Polymerizable Liquid Crystal Compounds

Introduction

Shunsuke Irie is a prominent inventor based in Tokyo-to, Japan. He has made significant contributions to the field of polymerizable liquid crystal compounds, holding a total of 4 patents. His work has advanced the development of various optical materials and devices.

Latest Patents

Irie's latest patents include a range of innovative products such as polymerizable liquid crystal compounds, polymerizable compositions, polymers, and retardation films. He has also developed methods for producing retardation films and optical members, as well as transfer laminates and display devices. These inventions are represented by a general formula that showcases the complexity and utility of his work.

Career Highlights

Shunsuke Irie is currently employed at Dai Nippon Printing Co., Ltd., where he continues to push the boundaries of optical technology. His expertise in polymer chemistry and liquid crystal technology has positioned him as a key figure in his field.

Collaborations

Irie collaborates with talented coworkers such as Mami Motooka and Ken-ichi Okuyama, contributing to a dynamic and innovative work environment.

Conclusion

Shunsuke Irie's contributions to the field of polymerizable liquid crystal compounds highlight his role as a leading inventor in optical technology. His patents and ongoing work continue to influence advancements in this important area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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