Nagoya, Japan

Shunsuke Asami

This inventor holds 1 USPTO granted patent. Top assignee: Nichiha Corp.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shunsuke Asami. Retrieved from https://idiyas.com/inventor/shunsuke-asami

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Shunsuke Asami: Innovator in Building Technology

Introduction

Shunsuke Asami is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of building technology, particularly with his innovative solutions for construction challenges. His work is recognized for its practicality and effectiveness in enhancing building safety and efficiency.

Latest Patents

Shunsuke Asami holds a patent for a member designed for closing a hole in a building board. This invention addresses a common issue in construction, providing a reliable method to ensure structural integrity and safety. His patent portfolio includes 1 patent, showcasing his focused approach to innovation.

Career Highlights

Asami is currently employed at Nichiha Corporation, a company known for its advancements in building materials and technology. His role at Nichiha allows him to apply his inventive skills in a practical setting, contributing to the development of high-quality construction solutions.

Collaborations

Shunsuke Asami collaborates with his coworker, Yoshio Ochi, to further enhance their projects and innovations. Their teamwork exemplifies the importance of collaboration in the field of invention, leading to more refined and effective solutions.

Conclusion

Shunsuke Asami's contributions to building technology through his patent and work at Nichiha Corporation highlight his role as an important figure in the industry. His innovative spirit continues to drive advancements in construction safety and efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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