Shanghai, China

Shunke Ding

This inventor holds 1 USPTO granted patent. Top assignee: Tongji University. Active years: 2020.


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Shunke Ding: Innovator in Water Treatment Technologies

Introduction

Shunke Ding is a notable inventor based in Shanghai, China. He has made significant contributions to the field of water treatment through his innovative methods. His work focuses on controlling disinfection by-products in water, which is crucial for public health and environmental safety.

Latest Patents

Shunke Ding holds a patent for a method titled "Method for controlling chlorinated nitrogen-containing disinfection by-product in water." This patent describes a comprehensive approach that includes controlling the pH value of a water sample, utilizing ultraviolet irradiation treatment, and adding persulfate or hydrogen persulfate. The method culminates in chlorination disinfection followed by aeration treatment, effectively removing chlorinated nitrogen-containing disinfection by-products from water. This innovation can significantly reduce the formation of harmful trichloromethane during the chlorination disinfection process.

Career Highlights

Shunke Ding is affiliated with Tongji University, where he continues to advance research in water treatment technologies. His work is recognized for its practical applications in improving water quality and safety. With a focus on innovative solutions, he has established himself as a key figure in his field.

Collaborations

Shunke Ding collaborates with esteemed colleagues such as Wenhai Chu and Dongmei Li. Their combined expertise enhances the research and development of effective water treatment methods.

Conclusion

Shunke Ding's contributions to water treatment through his patented methods demonstrate his commitment to innovation and public health. His work not only addresses critical environmental challenges but also sets a foundation for future advancements in the field.

Profile summary based on public USPTO records.
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