Kanagawa, Japan

Shunji Kawakami

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shunji Kawakami. Retrieved from https://idiyas.com/inventor/shunji-kawakami

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Shunji Kawakami: Innovator in Substrate Processing Technology

Introduction

Shunji Kawakami is a prominent inventor based in Kanagawa-ken, Japan. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique processing apparatus that enhances the uniformity of thin film deposition.

Latest Patents

Kawakami holds a patent for a "Processing apparatus for substrates to be processed." This invention features a partition member with a buffer plate on its top surface, strategically placed in the processing apparatus. An injector with decreasing cross-sectional areas is integrated into the partition member, allowing for uniform injection of processing gas. This design ensures that the gas diffuses evenly, resulting in high intra-surface thickness uniformity of the deposited thin film.

Career Highlights

Shunji Kawakami is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in advancing technologies that improve the efficiency and effectiveness of substrate processing.

Collaborations

Kawakami has collaborated with notable colleagues, including Yoji Mizutani and Yutaka Miura. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Shunji Kawakami's innovative contributions to substrate processing technology exemplify the impact of dedicated inventors in the field. His patent and work at Tokyo Electron Limited continue to influence advancements in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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