Tokyo, Japan

Shunji Enomoto

This inventor holds 2 USPTO granted patents. Top assignees: Japan Aerospace Exploration Agency, Japan Oxygen, Co., Ltd.. Active years: 1991-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shunji Enomoto. Retrieved from https://idiyas.com/inventor/shunji-enomoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 1991-2025

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2 patents (USPTO):Explore Patents

Title: Shunji Enomoto: Innovator in Adsorptive Separation Processes

Introduction

Shunji Enomoto is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of adsorptive separation processes. His innovative work has led to the development of a patented technology that enhances efficiency in various applications.

Latest Patents

Shunji Enomoto holds a patent for an adsorptive separation process. This invention showcases his expertise and commitment to advancing technology in his field. The patent represents a significant achievement in the realm of separation technologies.

Career Highlights

Enomoto is currently employed at Japan Oxygen Co., Ltd. His role at the company allows him to apply his innovative ideas and contribute to the development of advanced separation technologies. His work has garnered attention within the industry for its potential applications.

Collaborations

Shunji Enomoto has collaborated with notable colleagues, including Hidetake Okada and Masato Kawai. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Shunji Enomoto is a distinguished inventor whose work in adsorptive separation processes has made a significant impact. His contributions to Japan Oxygen Co., Ltd. and collaborations with esteemed colleagues highlight his dedication to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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