Wilmington, DE, United States of America

Shung-Yan L Lee

This inventor holds 1 USPTO granted patent. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1985.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shung-Yan L Lee. Retrieved from https://idiyas.com/inventor/shung-yan-l-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1985

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1 patent (USPTO):Explore Patents

Title: Shung-Yan L Lee: Innovator in Photopolymerizable Compositions

Introduction

Shung-Yan L Lee is a notable inventor based in Wilmington, DE (US). He has made significant contributions to the field of photopolymerizable compositions, particularly in enhancing the resistance of materials to stain and scum formation.

Latest Patents

Shung-Yan L Lee holds 1 patent for his invention titled "Photopolymerizable compositions and elements containing acid to reduce." This patent describes aqueous processable photopolymerizable compositions that include a polymerizable ethylenically unsaturated monomer, a photoinitiator or photoinitiator system, and an acid binder. The innovation focuses on incorporating an acid with specific properties to improve the performance of the compositions on copper surfaces.

Career Highlights

Shung-Yan L Lee is associated with E.I. du Pont de Nemours and Company, a leading organization in the field of chemical manufacturing. His work has contributed to advancements in photopolymer technology, showcasing his expertise and commitment to innovation.

Collaborations

One of his notable coworkers is Richard Albert Coveleskie. Their collaboration has likely fostered advancements in their respective fields, enhancing the quality and applicability of their inventions.

Conclusion

Shung-Yan L Lee's contributions to photopolymerizable compositions demonstrate his innovative spirit and dedication to improving material performance. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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