Tochigi, Japan

Shun Toda

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Canon Kabushiki Kaisha. Active years: 2026.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Shun Toda: Innovator in Detection Technology

Introduction

Shun Toda is a prominent inventor based in Tochigi, Japan. He has made significant contributions to the field of detection technology, particularly in the area of lithography apparatus and manufacturing methods. His innovative work has led to the development of a unique detection device that enhances the precision of manufacturing processes.

Latest Patents

Shun Toda holds a patent for a detection device, lithography apparatus, and article manufacturing method. This detection device is designed to detect the relative position between first and second marks that overlap each other. The device features an illumination system that illuminates the marks with light, and a detection system that forms an image on the imaging surface of an image sensor from the diffracted lights of the marks. This technology allows for the formation of optical information that represents the relative position in either the first or second direction. The illumination light is directed through the optical axis of the illumination system on the pupil surface, ensuring accuracy in detection.

Career Highlights

Shun Toda is associated with Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to focus on advancing detection technologies that are crucial for high-precision manufacturing. His contributions have been instrumental in enhancing the capabilities of lithography systems used in various industries.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Shun Toda's innovative work in detection technology exemplifies the importance of precision in manufacturing processes. His patent reflects a significant advancement in the field, showcasing his expertise and commitment to innovation.

Profile summary based on public USPTO records.
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